You hit the nail on the head!
To be a little more precise, do the following. You first expose the double lines on the scales, then create, carve and inspect. You spin coat again, so use your photosensitive varnish (photoresist). Then you load another mask into the machine, with the fill pattern on it, in this case the odd lines. Those odd lines are already in place on your mask, so you don’t have to replace your entire scales with purpose-built patterns. Then you flash it.
In the case of simple lines, you could theoretically use the same mask with offset scaling. In practice you don’t have simple lines, but in fact they have structures, and the line equivalent of double lines isn’t quite right. So you really need to use two masks.
Some contexts may include: Masks in lithography contain your primary form. Photolithography machines such as ASML are essentially large slide projectors in which the key pattern on the slide (mask) is repeatedly imaged onto a screen (wafer). What happens in scales is similar to what happens in analog photography. Instead of a projector screen, you hold a roll of film in front of your slide projector, which prints the slide onto your roll of film. The film roll is spun on a photoresist (photosensitive lager) wafer.
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